Global Sputtering Target Material Market Size, Manufacturers, Supply Chain, Sales Channel and Clients, 2020-2026

Sputtering is the process of forming a thin film when the object is attached to the target substrate by the sputtering and scattering, and the sputtering target is the material for high-speed particle bombardment. This report studies the sputtering target material market.
Semiconductor chips, flat panel displays, solar cells and other downstream industries have a higher demand on the product quality and stability. When the downstream customers, especially the world's leading companies select suppliers, the supplier qualification barriers are higher, and the certification cycle is longer.For a long time the global sputtering target development and production mainly concentrated in the Europe, United States and Japan, and the industry concentration is quite high. Manufactures of sputtering targets, represented by Mitsui Mining & Smelting (Japan), Praxair (USA), JX Nippon Mining & Metals Corporation (Japan), Plansee SE (Austria), Hitachi Metals (Japan), Honeywell (USA), Sumitomo Chemical (Japan), ULVAC (Japan) and other multinational groups, have been involved in this field earlier. After decades of technical accumulation, they occupy the vast majority of market share.

Market Analysis and Insights: Global Sputtering Target Material Market
In 2019, the global Sputtering Target Material market size was US$ 3786.2 million and it is expected to reach US$ 6275.1 million by the end of 2026, with a CAGR of 7.4% during 2021-2026.
Global Sputtering Target Material Scope and Market Size
Sputtering Target Material market is segmented by region, by country, company, type, application and by sales channels. Players, stakeholders, and other participants in the global Sputtering Target Material market will be able to gain the upper hand as they use the report as a powerful resource. The segmental analysis focuses on sales, revenue and forecast by region, by country, company, type, application and by sales channels for the period 2015-2026.

Segment by Type, the Sputtering Target Material market is segmented into
Metal Target
Alloy Target
Ceramic Compound Target

Segment by Application, the Sputtering Target Material market is segmented into
Semiconductor
Solar Energy
LCD Flat Panel Display
Others Flat Panel Display

Regional and Country-level Analysis:
North America
United States
Canada
Asia-Pacific
China
Japan
South Korea
India
Southeast Asia
Australia
Rest of Asia-Pacific
Europe
Germany
France
U.K.
Italy
Russia
Nordic Countries
Rest of Europe
Latin America
Mexico
Brazil
Rest of Latin America
Middle East & Africa
Turkey
Saudi Arabia
UAE
Rest of MEA

Competitive Landscape

and Sputtering Target Material Market Share Analysis
Sputtering Target Material market competitive landscape provides details and data information by companies. The report offers comprehensive analysis and accurate statistics on revenue by the player for the period 2015-2020. It also offers detailed analysis supported by reliable statistics on sale and revenue by players for the period 2015-2020. Details included are company description, major business, Sputtering Target Material product introduction, recent developments, Sputtering Target Material sales by region, type, application and by sales channel.

The major companies include:
Materion (Heraeus)
JX Nippon Mining & Metals Corporation
Praxair
Plansee SE
Mitsui Mining & Smelting
Hitachi Metals
Honeywell
Sumitomo Chemical
ULVAC
GRIKIN Advanced Material Co., Ltd.
TOSOH
Ningbo Jiangfeng
Heesung
Luvata
Fujian Acetron New Materials Co., Ltd
Changzhou Sujing Electronic Material
Luoyang Sifon Electronic Materials
FURAYA Metals Co., Ltd
Advantec
Angstrom Sciences
Umicore Thin Film Products