Global Extreme Ultraviolet Lithography Market Size, Status and Forecast 2020-2026
SKU ID : QYR-15949341 | Publishing Date : 20-Jul-2020 | No. of pages : 98
The global Extreme Ultraviolet Lithography market size is projected to reach US$ XX million by 2026, from US$ XX million in 2020, at a CAGR of XX%% during 2021-2026.
Global Extreme Ultraviolet Lithography Scope and Market Size
Extreme Ultraviolet Lithography market is segmented by Type, and by Application. Players, stakeholders, and other participants in the global Extreme Ultraviolet Lithography market will be able to gain the upper hand as they use the report as a powerful resource. The segmental analysis focuses on revenue and forecast by Type and by Application in terms of revenue and forecast for the period 2015-2026.
The key players covered in this study
ASML
Canon
Nikon
Intel
IBM
AMD
Micron
Motorola
SUSS Microtec AG
NuFlare Technology Inc.
Samsung Corporation
Ultratech Inc.
Vistec Semiconductor Systems
Market segment by Type, the product can be split into
Laser Produced Plasmas (LPP)
Vacuum Sparks
Gas Discharges
Market segment by Application, split into
Memory
IDM
Foundry
Others
Market segment by Regions/Countries, this report covers
North America
Europe
China
Japan
Southeast Asia
India
Frequently Asked Questions
- By product type
- By End User/Applications
- By Technology
- By Region